SiOnyx, LLC v. Hamamatsu Photonics K.K.

Procedural entryThis page is a short order in SiOnyx, LLC v. Hamamatsu Photonics K.K.. Read the opinion of the Court — 270 F. Supp. 3d 390
District Court, D. Massachusetts·Decided August 30, 2018·No. 1:15-cv-13488·Unknown

Opinion

UNITED STATES DISTRICT COURT DISTRICT OF MASSACHUSETTS

_______________________________________ ) SIONYX, LLC and PRESIDENT AND ) FELLOWS OF HARVARD COLLEGE, ) ) Civil Action No. Plaintiffs, ) 15-13488-FDS ) v. ) ) HAMAMATSU PHOTONICS K.K., ) HAMAMATSU CORP., and ) OCEAN OPTICS, INC., ) ) Defendants. ) _______________________________________)

MEMORANDUM AND ORDER ON CROSS-MOTIONS FOR SUMMARY JUDGMENT

SAYLOR, J. This is an action for patent infringement, breach of contract, and correction of inventorship. The technology at issue involves a device that improves the detection of near- infrared light, which has a variety of potential commercial and scientific applications. Plaintiff SiOnyx, LLC alleges that it approached defendant Hamamatsu Photonics K.K. (“HPK”) concerning a potential business partnership involving the technology. The parties entered into a nondisclosure agreement and SiOnyx provided HPK with certain technical information. SiOnyx alleges that after the approach proved unsuccessful, HPK violated the nondisclosure agreement, obtained patents on SiOnyx’s technology without naming SiOnyx personnel as inventors, and infringed other patents held by SiOnyx. HPK contends that its engineers independently developed the technology contained in its patents and practiced by its products, and that it does not infringe SiOnyx’s patents. Defendants previously filed six motions for partial summary judgment, and plaintiffs filed a seventh, which the court addressed in a memorandum and order on July 24, 2018. Defendants have now filed five additional motions for partial summary judgment, and plaintiffs have filed another such motion. For the following reasons, those motions will be granted in part and denied in part.

I. Background A. Factual Background The following facts appear to be undisputed. 1. The Parties SiOnyx, LLC was founded in 2006 by Eric Mazur, a physics professor at Harvard University, and James Carey, his former doctoral student. (ECF 337-40 at 7:5-6, 8:3-9:7). Their goal was to commercialize laser-textured black silicon photodetectors, which had been the topic of Carey’s Ph.D. dissertation and postdoctoral work in Mazur’s laboratory. (ECF 337-40 at 9:15-11:11). Stephen Saylor joined SiOnyx in the fall of 2006 as President and CEO. (ECF 337-40 at 9:8-14).1 SiOnyx owns U.S. Patent No. 8,680,591, which it asserts in this lawsuit. (ECF 163-2 ¶¶ 12-17, 19).

The President and Fellows of Harvard College (“Harvard”) are the assignees of the other patent asserted in this lawsuit, U.S. Patent No. 8,080,467, which covers Mazur and Carey’s work.2 SiOnyx is the exclusive licensee of that patent. (ECF 342 Ex. G). Hamamatsu Photonics K.K. is a Japanese integrated photonics company that researches,

1 Stephen Saylor is no relation to the undersigned judge. 2 The complaint in this case also included allegations of infringement of U.S. Patent No. 7,884,446 (owned by Harvard and naming Mazur as an inventor), but the parties have since stipulated to dismissal of that patent from the suit. (ECF 422). develops, and manufactures optical devices and image sensors. (ECF 163-2 ¶¶ 54-55; ECF 178 ¶¶ 54-55; ECF 337-41 at 114:5-18). It is the assignee of U.S. Patent Nos. 8,564,087; 8,629,485; 8,742,528; 8,884,226; 8,916,945; 8,994,135; 9,190,551; 9,293,499; and 9,614,109, in addition to several Japanese patents covering similar inventions. (ECFs 337-22 through 337-31). Hamamatsu Corporation (“HC”) is the marketing and sales company responsible for

distributing HPK’s products in North America. (ECF 97 at 3). It is a New Jersey corporation with its principal place of business in New Jersey. (ECF 97 at 3). HC is a wholly owned subsidiary of Photonics Management Corp., which is a holding company owned by HPK. (ECF 97 at 3, 13). HC purchases products from HPK at a price set by HPK. (ECF 97 at 3; ECF 382-1 at 62:21-65:7). HC has the authority to set its own resale prices, and it separately profits from its sales to end users. (ECF 97 at 3; ECF 382-1 at 62:21-65:7). Ocean Optics is a Florida corporation with its principal place of business in Florida. (ECF 163-2 ¶ 6). It primarily sells spectrometers, some of which incorporate photodiodes purchased from HC. (See ECF 529-2 at 6, 9; ECF 529-3 at 107:13-108:20, 146:2-11).

2. The Technology at Issue The technology at issue involves silicon photodetectors where one surface has been irradiated by a pulsed laser beam. The photodetectors use p-n photodiodes, which work by transforming light into electrical current. The photodiode is formed from a silicon semiconductor substrate that has two types of charge-neutral impurities: (1) those that donate electrons (n-type impurities) and (2) those that accept electrons (p-type impurities), which can be said to have electron “holes.” (ECF 377-1 at 87). When n-doped silicon is placed next to p-doped silicon, it creates a p-n junction, around which the electrons and holes rearrange themselves until they reach an equilibrium. (ECF 377-1 at 88-89). At equilibrium, there is a thin insulating layer at the juncture where the electrons and holes (charge carriers) have recombined (depletion region), and an electric field—created by the ions left behind when the electrons and holes diffused away—preventing further diffusion. (ECF 377-1 at 89; see ECF 201 at 13:10-14:20). The outermost electrons associated with the silicon substrate are said to be in the “valence band,” and have a certain energy. The next-highest energy state available is in the

“conduction band.” The difference in energy between the valence band and the conduction band is a physical property of the semiconductor material; for silicon, the band-gap energy is about 1.07 eV, which corresponds to light with a wavelength around 1100 nm. (ECF 377-1 at 1, 63- 64). If a photon of sufficient energy (that is, for silicon, one with a wavelength of less than 1100 nm) interacts with the silicon substrate, it may transfer its energy to an electron in the valence band and promote it to the conduction band; in other words, the photon is absorbed. (ECF 377-1 at 63; see ECF 201 at 10:21-11:21). Higher-energy photons will be absorbed closer to the light-incident surface, while lower-energy photons are absorbed deeper in the substrate.

(ECF 386 Ex E at HPK0022535; see ECF 201 at 12:8-13:9, 15:11-16:16). When a photon is absorbed, it creates an electron-hole pair (by promoting an electron to the conduction band). (ECF 377-1 at 93). If the photon is absorbed in the depletion region of the photodiode, the electron and the hole are immediately separated because of the electric field, which creates a current. (ECF 377-1 at 93-94). Photons absorbed too far away from the depletion region are much less likely to produce a current. (ECF 201 at 15:11-16:16). Thus, in an ordinary p-n photodiode, light enters through one surface of the photodiode and, to some extent, is absorbed in the depletion region, resulting in electric current. (ECF 377-1 at 63). Light that is not absorbed will either go right through the photodiode (in which case it does not contribute to the sensitivity of the photodiode) or reflect off the back surface of the photodiode back into the photodiode, in which case it has another opportunity to be absorbed and turned into current. (’109 patent, col. 7 ll. 24-34). Whatever portion of that light is still unabsorbed after a second trip through the photodiode will either pass through the light-incident surface (again without contributing to the sensitivity of the photodiode) or be reflected by that

surface, and so on. (’109 patent, col. 7 ll. 34-37). Infrared light is more likely to go through the photodiode without being absorbed than visible light, because its longer wavelength (and correspondingly lower energy) is absorbed deeper in the substrate and its energy may be insufficient to bridge the band gap of the silicon semiconductor.

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