Asahi Glass Co., Ltd. v. GUARDIAN INDUSTRIES CORP.

813 F. Supp. 2d 602, 2011 U.S. Dist. LEXIS 109249, 2011 WL 4448576
CourtDistrict Court, D. Delaware
DecidedSeptember 26, 2011
DocketCiv. 09-515-SLR
StatusPublished
Cited by2 cases

This text of 813 F. Supp. 2d 602 (Asahi Glass Co., Ltd. v. GUARDIAN INDUSTRIES CORP.) is published on Counsel Stack Legal Research, covering District Court, D. Delaware primary law. Counsel Stack provides free access to over 12 million legal documents including statutes, case law, regulations, and constitutions.

Bluebook
Asahi Glass Co., Ltd. v. GUARDIAN INDUSTRIES CORP., 813 F. Supp. 2d 602, 2011 U.S. Dist. LEXIS 109249, 2011 WL 4448576 (D. Del. 2011).

Opinion

MEMORANDUM OPINION

SUE L. ROBINSON, District Judge.

I. INTRODUCTION

Asahi Glass Co., Ltd. (“AGC”) and AGC Flat Glass North America, Inc. (“AFNA”) (collectively, “plaintiffs”) filed a complaint against Guardian Industries Corporation (“Guardian”) on July 15, 2009, alleging infringement of plaintiffs’ U.S. Patent Nos. 3,664,938 (“the '938 patent”) and 6,193,856 (“the '856 patent”) (hereinafter, collectively the “patents in suit”). (D.I. 1) Defendant brought declaratory judgment counterclaims of noninfringement and invalidity under 35 U.S.C. §§ 101, 102, 103, 112 and 113. (D.I. 9) On March 3, 2011, defendant moved to amend its affirmative defenses and counterclaims to add new allegations of inequitable conduct. (D.I. 88) Fact discovery closed March 15, 2011 and expert discovery closed April 15, 2011. (D.I. 82, 87) The parties briefed issues of claim construction and several motions for summary judgment: (1) plaintiffs’ motion for partial summary judgment of infringement of claim 16 of the '856 patent and claims 1, 3-4, 7-11 and 18-20 of the'938 patent (D.I. 115); (2) defendant’s motion for summary judgment of noninfringement of these asserted claims and, in addition, claims 11, 12, 14 and 15 of the '856 patent and claims 23-25 of the '938 patent (D.I. 122); and (3) defendant’s motion for summary judgment of invalidity of the '938 and '856 patents (D.I. 120). 1 The court denied defendant’s motion to amend on August 12, 2011. (D.I. 174) The issues of claim construction and summary judgment are presently before the court. The court has jurisdiction over these matters pursuant to 28 U.S.C. § 1338.

II. BACKGROUND

A. Overview

This case involves technology for applying thin film coatings to glass. One popular metallic coating, titanium dioxide, is highly refractive and also imparts “antibacterial, antifouling or drip flowing” properties to glass. ('856 patent, col. 13:33-37) Coatings are not applied directly onto glass. Rather, a “sputtering” process is employed. Generally, sputtering involves bombarding a sputtering target with charged ions. Metallic atoms from the target (the “target material”) are displaced and fall to the surface of a sheet of glass passing below the target. This process of displacing atoms from the sputtering tar *606 get is analogous to using a cue ball to hit a billiard ball. The result is a thin metal oxide film being deposited on the glass surface.

Sputtering targets may be made by several processes, such as sintering and plasma spraying. Sintering involves creating a target by placing a powder form of the target in a mold and subjecting it to heat and pressure. By this process, the powder solidifies into a mass that becomes the target. Plasma spraying, as its name implies, involves heating and spraying powder material onto a target substrate where it solidifies and hardens. Semi-molten powder particles are coated onto a substrate (such as a cylindrical tube) in layers until the desired thickness is achieved.

B. The Patented Technology

The patents in suit are related as parent and continuation applications; 2 they have a common specification. Both patents are entitled “target and process for its production, and method for forming a film having a highly refractive index.” The '856 patent issued on February 27, 2001 and the '938 patent issued on January 1, 2002.

The patents teach that excellent optical properties are imparted to glass by employing both a high refractive index film and a low refractive index film; the larger the difference between the two, the better the result. ('856 patent, col. 1:33-36) Direct current (or “DC”) sputtering is “most suitable for forming a film over a large area” of glass. (Id., col. 1:49-51) Reactive (DC) sputtering — a process whereby a metallic target having electroconductivity is subjected to sputtering in an atmosphere containing oxygen — has certain pitfalls such as poor productivity and high cost. (Id., col. 1:53-60)

The inventors provide an “electroconductive sputtering target which can be formed into any desired shape and which is capable of forming a high refractive index film at a high speed by DC sputtering, a process for its production, and a method for forming a high refractive index film using such a target.” (Id., col. 2:56-61) The target material of the invention comprises a metal oxide of the formula MOx as the main component, where M is selected from the group consisting of Ti (titanium), Nb (niobium), Ta (tantalum), Mo (molybdenum), W (tungsten), Zr (zirconium) and Hf (hafnium) and, importantly, the metal oxide is deficient in oxygen as compared with the stoichiometric composition. (I d., col. 2:64-col. 3:4) Thus, when M in MOx is Mo and/or W, x is preferably within the range of 2<x<3. (Id., col. 3:19-21) When the metal is selected from the group consisting of Ti, Zr and Hf, x is preferably within a range of 1<x<2. (Id., col. 3:21-24) As a comparative example, stoichiometrieally-balanced titanium oxide has the molecular formula Ti02. The substoichiometric targets of the patents (TiOx) may have the formula TiOL80 or TiOLgo.

The patents refer to the advantages of these formulas.

By using the sputtering target of the present invention, a transparent film having a high refractive index can be formed at a high speed by DC sputtering ... [and] a film having a high refractive index can be produced at a high speed and under a stabilized condition.

(Id., col. 13:13-21) The targets are easily produced in a variety of shapes and resist thermal shock, and cracking or breakage when high sputtering power is imparted, *607 thus increasing productivity. (Id., col. 13:22-27, 13:38-45)

1. Sputtering target claims

This case involves both what the parties refer to as “sputtering target claims” ('856 patent claim 16 and '938 patent claims 10-11 and 18-20) and “film forming claims” ('938 patent claims 1, 3-4 and 7-9). Claim 16 of the '856 reads as follows.

16. A sputtering target comprising a substrate and a target material formed on the substrate, wherein
the target material comprises as a main component an oxygen deficient oxide; the oxygen deficient oxide comprises at least one metal oxide of a chemical formula TiOx that is deficient in oxygen as compared with a stoichiometric composition of the at least one metal oxide; and l<x<2.

Free access — add to your briefcase to read the full text and ask questions with AI

Related

McRo, Inc. v. Namco Bandai Games America, Inc.
23 F. Supp. 3d 1113 (C.D. California, 2013)
Asahi Glass Co. v. Guardian Industries Corp.
886 F. Supp. 2d 369 (D. Delaware, 2012)

Cite This Page — Counsel Stack

Bluebook (online)
813 F. Supp. 2d 602, 2011 U.S. Dist. LEXIS 109249, 2011 WL 4448576, Counsel Stack Legal Research, https://law.counselstack.com/opinion/asahi-glass-co-ltd-v-guardian-industries-corp-ded-2011.