The Fox Group, Inc. v. Cree, Inc.

819 F. Supp. 2d 490, 2011 U.S. Dist. LEXIS 62030, 2011 WL 2308694
CourtDistrict Court, E.D. Virginia
DecidedJune 10, 2011
DocketAction 2:10cv314
StatusPublished
Cited by3 cases

This text of 819 F. Supp. 2d 490 (The Fox Group, Inc. v. Cree, Inc.) is published on Counsel Stack Legal Research, covering District Court, E.D. Virginia primary law. Counsel Stack provides free access to over 12 million legal documents including statutes, case law, regulations, and constitutions.

Bluebook
The Fox Group, Inc. v. Cree, Inc., 819 F. Supp. 2d 490, 2011 U.S. Dist. LEXIS 62030, 2011 WL 2308694 (E.D. Va. 2011).

Opinion

OPINION

REBECCA BEACH SMITH, District Judge.

This matter comes before the court for claim construction. On April 18, 2011, the court conducted a hearing pursuant to Markman v. Westview Instruments, Inc., 517 U.S. 370, 372, 116 S.Ct. 1384, 134 L.Ed.2d 577 (1996) (“Markman hearing”), and heard argument from both parties as to the meaning of the terms in the disputed claims of the patents at issue. This Opinion details the court’s claim construction and explains its reasoning. See MercExchange LLC v. eBay, Inc., 401 F.3d 1323, 1329 (Fed.Cir.2005), vacated on other grounds, eBay, Inc. v. MercExchange LLC, 547 U.S. 388, 126 S.Ct. 1837, 164 L.Ed.2d 641 (2006).

I. Procedural History

This case involves the alleged infringement of U.S. Patent Number 6,562,130 (“the 130 patent”) and U.S. Patent Number 6,534,026 (“the '026 patent”), which are owned by The Fox Group, Inc. (“Fox”) and relate to growth of silicon carbide (SiC), a semiconductor material composed of silicon and carbon. Fox filed suit on June 29, 2010, seeking injunctive relief against alleged patent infringement by Cree, Inc. (“Cree”), as well as compensatory damages. 1 Fox alleges that “Cree has been making, using, selling, and/or offering for sale silicon carbide substrates and products that use silicon carbide that practice the invention of the '026 patent [and the 130 patent], and thus, infringe one or more claims of [those patents.]” Compl. ¶¶ 21 and 34, ECF No. 1. Fox also alleges that Cree will continue to infringe those patents unless enjoined by the court. Id. ¶¶ 22 and 35. On August 30, 2010, Cree answered the Complaint and filed a counterclaim against Fox seeking declarations that the claims of the '026 and 130 patents are (1) not infringed; (2) invalid; and (3) unenforceable. See Answer 32-33, ECF No. 12. Cree also seeks an award of attorney’s fees and costs. Fox answered Cree’s counterclaim on September 23, 2010.

Pursuant to this court’s 16(b) scheduling order and a subsequent order extending filing times, the parties submitted their initial claim construction briefs on January 28, 2011, their reply claim construction briefs on February 10, 2011, and their joint claim construction brief on February 24, 2011. On March 8, 2011, this court scheduled a Markman hearing to aid the court in construing the disputed terms of the two patents. The court held the Markman hearing on April 18, 2011, and heard argument on the issue of claim construction. At the end of the hearing, the court took the matter under advisement and permitted the parties to submit post-hearing submissions on or before April 29, 2011. On April 29, 2011, Fox and Cree each filed a supplemental claim construction brief.

II. Factual Background

SiC crystal is a semiconductor material grown via man-made methods and used in *495 high-temperature and high-power electronics such as light sources, power diodes, and photodiodes. The quality of the SiC material (i.e. a low level of defects) is critical to its viability as a semiconductor. For many years, the growth methods available made it difficult to produce low-defect SiC in a form that makes SiC commercially viable as a semiconductor. The general growth method at issue here is seeded sublimation, in which single crystal SiC is grown in crucibles under high heat. Specifically, a “seed” crystal of SiC is inserted into a crucible along with SiC “source” material — typically SiC powder. Heat is applied to the crucible, causing the SiC source material to sublime — turn from solid to gas — and then condense on the seed, thereby growing a single crystal SiC material that can be processed into semiconductors for electronic devices.

The inventions set forth in the two patents at issue purportedly enable growth of commercially viable, low-defect single crystal SiC. SiC grown by utilizing the specific seeded sublimation method and apparatus set forth in each patent should contain low levels of those defects typically associated with SiC crystal growth: dislocations, micropipes, and secondary phase inclusions. The '130 patent describes low-defect SiC growth away from the seed crystal in an “axial” direction. The '026 patent also describes low-defect SiC growth away from the seed crystal, but it describes the growth in both an axial and a “lateral” direction. 2

The '130 patent is entitled “Low Defect Axially Grown Single Crystal Silicon Carbide.” It contains twenty-six (26) claims, all of which assert certain properties of SiC material grown by utilizing the method and apparatus provided for in the '130 patent. Independent claims 1, 7, 13, and 19 are at issue in this proceeding. With one exception, claims 1, 7, and 13 are identical. All three claims assert:

A silicon carbide material comprising an axial region of re-crystallized single crystal silicon carbide with a density of dislocations of less than [a specified amount], a density of micropipes of less than 10 per square centimeter, and a density of secondary phase inclusions of less than 10 per cubic centimeter.

See '130 patent col.8 11.6-11 and 39-44, Ex. I to Compl., EOF No. 1-9 [hereinafter “'130 patent”]; id. col.9 11.4-9. The exception is that each claim specifies a different “density of dislocations”: claim 1 requires a density of dislocations of less than 104 per square centimeter, claim 7 requires less than 103 per square centimeter, and claim 13 requires less than 102 per square centimeter.

Claim 19 is similar to claim 1. It requires “silicon carbide material” having the same density of dislocations, the same density of micropipes, and the same density of secondary phase inclusions as required in claim 1. Unlike claim 1, however, claim 19 requires a “silicon carbide seed crystal,” id. col.9 1.38, and “a region of axially re-crystallized silicon carbide ... initiating at [the] growth surface of ... [the] seed crystal.’ ” Id. eols.9 1.41-10 1.1. The differences in claim 19 as compared to claim 1 are underscored below for ease of comparison:

19. A silicon carbide material, comprising:
A single crystal silicon carbide seed crystal, said single crystal silicon car *496 bide seed crystal having a growth surface; and
A region of axially re-crystallized silicon carbide, said region of axially re-crystallized silicon carbide initiating at said growth surface of said single crystal silicon carbide seed crystal, said region of axially re-crystallized silicon carbide having a density of dislocation of less than 10 4 per square centimeter, a density of micropipes of less than 10 per square centimeter, and a density of secondary phase inclusions of less than 10 per cubic centimeter.

Id. eols.9 1.37-10 1.6 (emphasis added).

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819 F. Supp. 2d 490, 2011 U.S. Dist. LEXIS 62030, 2011 WL 2308694, Counsel Stack Legal Research, https://law.counselstack.com/opinion/the-fox-group-inc-v-cree-inc-vaed-2011.