John H. Bruning v. Ryusho Hirose

161 F.3d 681
CourtCourt of Appeals for the Federal Circuit
DecidedNovember 25, 1998
Docket567
StatusPublished
Cited by30 cases

This text of 161 F.3d 681 (John H. Bruning v. Ryusho Hirose) is published on Counsel Stack Legal Research, covering Court of Appeals for the Federal Circuit primary law. Counsel Stack provides free access to over 12 million legal documents including statutes, case law, regulations, and constitutions.

Bluebook
John H. Bruning v. Ryusho Hirose, 161 F.3d 681 (Fed. Cir. 1998).

Opinion

RADER, Circuit Judge.

This appeal arises from Interference No. 102,567 between John H. Bruning (Bruning) and Ryusho Hirose (Hirose) before the Board of Patent Appeals & Interferences (the Board). See Bruning v. Hirose, Patent Interference No. 102,567 (Bd. Pat.App. & Int. Sept. 8, 1993) (Final Decision); Bruning v. Hirose, Patent Interference No. 102,567 (Bd. Pat.App. & Int. Feb. 13, 1997) (Reconsideration Decision). Junior party Bruning appeals the Board’s decision that U.S. Patents Nos. 4,773,750 and 4,883,352 (“the Bruning Patents”) are invalid under the best mode requirement of 35 U.S.C. § 112. Senior party Hirose cross-appeals from the Board’s decision that the Bruning patents otherwise comply with 35 U.S.C. § 112, that Bruning is entitled to priority, and that Hi-rose cannot patent the subject matter of the interference count due to forfeiture or laches. This court affirms-in-part and reverses-in-part.

I.

The parties seek priority for an invention related to deep ultraviolet (UV) photolithog-raphy systems for defining fine features in semiconductor integrated circuits. In photol-ithography, a light source illuminates a circuit pattern and projects its image through a lens assembly onto a semiconductor wafer. Ultimately, the circuit pattern is etched into the wafer.

The lens assembly for this photolitho-graphic process, according to the terms of the count, must be capable of transmitting the light from the light source. Moreover, the lens assembly must achieve sharply focused images to produce fine circuit line widths on the microchips. These requirements demand special compositions and precise design parameters.

Conventional lithography employs light sources with relatively long wavelengths, typically around the 400 nm region. These light sources typically have wide bandwidths, however, and therefore generate light containing many different wavelengths, each of which focuses at a different distance from the lens. This effect, known as chromatic aberration, reduces the sharpness of projected circuit patterns. Conventionally, this effect is corrected by fabricating the lens elements of the assembly using multiple materials. Nonetheless, traditional photolithography cannot produce extremely fine line widths.

The subject matter of the interference count overcomes this problem with light from an excimer laser which has relatively short wavelengths, typically centered at 248 nm. Because this portion of the light spectrum is known as the deep UV region, this technology takes the name deep UV photolit-hography. By reducing the wavelength of transmitted light, the invention improves the *683 resolution of the circuit pattern image and produces lines as narrow as 0.5 micron.

Excimer laser light, however, has a drawback: only a few materials can transmit its wavelengths. Thus, the chromatic aberration effect, resulting from the excimer laser having a wide range of wavelengths centered around 248 nm, cannot be corrected simply by varying the materials for the lens elements. In fact, only one material, fused silica (SÍO2), is commonly used to make the lens. Instead of varying the lens materials, therefore, the interference count counters the chromatic aberration effect by adding gratings or etalons to the laser cavity, thereby narrowing the bandwidth.

Hirose’s validity challenges against Brun-ing’s patents focus on this lens assembly. The Bruning patents disclose only one material for the lens assembly, fused silica. See ’750 patent, col. 2, 11. 7-8; ’352 patent, col. 2, 11. 7-8 (identical disclosure). The Bruning specification depicts the lens assembly as a biconvex, single element projection lens. See ’750 patent, fig. 2; ’352 patent, fig. 2. In contrast, the Hirose application discloses ten examples of multi-element lens assemblies, each made entirely of fused silica, and also supplies the prescription of each lens.

In 1981, well before filing the applications that became the ’750 and ’352 patents, Brun-ing requested that Coherent, Tropel Division (Tropel), an independent lens manufacturer, design a projection lens for the deep UV photolithography system. Tropel’s “Work statement,” dated October 1, 1982, detailed its design progress and identified several areas of uncertainty that could affect the lens design and price:

The final area of uncertainty involves the likelihood that we would have to readjust the lens after it has been fully evaluated [by another laboratory] in order to correct for any image defects that were not detectable by our necessarily limited testing procedures. We anticipate that we will have to go through one iteration of this part. If it is necessary to perform more than one, it may be necessary to ask for additional funds.

Sometime before April 1984, Bruning approved Tropel’s blueprint for a lens design that included a fifteen element projection lens comprising an aspheric element. In fact, the October 1982 work statement had identified the surface of the aspheric lens element as a source for another “area of uncertainty.”

The Bruning ’750 and ’352 patents, containing identical disclosures, issued September 27, 1988 and November 28, 1989, respectively, and both claim the benefit of several prior U.S. applications, the earliest of which was filed June 21, 1984. Hirose, however, claims the benefit of his Japanese filing date, December 28,1983. Hirose filed his original U.S. application, Serial No. 06/682,232, on December 17,1984.

Under 35 U.S.C. § 120, Hirose filed three continuation applications: Serial Nos. 07/048,508 on May 11, 1987; 07/139,137 on December 23, 1987; and 07/212,081 on June 24, 1988. Notwithstanding his numerous re-filings, Hirose did not amend either his specification or claims nor did he cite new art or submit any affidavits or amendments. Furthermore, each continuation was filed and its parent application abandoned after Hirose received a notice of allowance in the previous application. On September 26, 1989, after Bruning’s ’750 patent issued, Hirose filed yet another continuation application, Serial No. 07/412,527, this time copying claims from the ’750 patent. Thereafter, the Patent & Trademark Office (PTO) declared an interference.

The interference involves claims 28-30 of Bruning’s ’750 patent, claims 1-2 of Brun-ing’s ’352 patent, and claims 7-10 of Hirose’s Application No. 07/412,527. The interference count, which is identical to claim 29 of the ’750 patent, recites:

In combination,
means for providing laser radiation that inherently is characterized by a relatively wide bandwidth,
a lens assembly made of a single optical material disposed in the path of said radiation and exhibiting unacceptably large chromatic aberrations in response to the wide-bandwidth radiation inherently supplied by said providing means,
*684

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161 F.3d 681, Counsel Stack Legal Research, https://law.counselstack.com/opinion/john-h-bruning-v-ryusho-hirose-cafc-1998.