Demaray LLC v. Intel Corporation

CourtDistrict Court, W.D. Texas
DecidedJune 1, 2023
Docket6:20-cv-00634
StatusUnknown

This text of Demaray LLC v. Intel Corporation (Demaray LLC v. Intel Corporation) is published on Counsel Stack Legal Research, covering District Court, W.D. Texas primary law. Counsel Stack provides free access to over 12 million legal documents including statutes, case law, regulations, and constitutions.

Bluebook
Demaray LLC v. Intel Corporation, (W.D. Tex. 2023).

Opinion

IN THE UNITED STATES DISTRICT COURT FOR THE WESTERN DISTRICT OF TEXAS WACO DIVISION

DEMARAY LLC, § Plaintiff § § W-20-CV-00634-ADA -v- § § INTEL CORPORATION, § Defendant § § § DEMARAY LLC, § Plaintiff § § W-20-CV-00636-ADA -v- § § SAMSUNG ELECTRONICS CO., LTD. § (A KOREAN COMPANY), SAMSUNG § ELECTRONICS AMERICA, INC., § SAMSUNG SEMICONDUCTOR, INC., § SAMSUNG AUSTIN § SEMICONDUCTOR, LLC, § Defendants § §s

CLAIM CONSTRUCTION ORDER AND MEMORANDUM IN SUPPORT THEREOF Before the Court are the Parties’ supplemental claim construction briefs: Defendants Intel Corporation; and Samsung Electronics Co., Ltd., Samsung Electronics America, Inc., Samsung Semiconductor, Inc., and Samsung Austin Semiconductor, LLC’s Opening and Response briefs (ECF Nos. 6-20-cv-00636 313 and 322,1 respectively) and Plaintiff Demaray’s Opening and Response briefs (ECF Nos. 315 and 323, respectively). The Court provided preliminary constructions for the disputed terms one day before the hearing. The Court held the Markman

1 Because Intel’s and Samsung’s brief are virtually identical, the Court will refer to Samsung’s briefs and more generally to the Samsung case (6-20-cv-00636). hearing on May 30, 2023. ECF No. 338. The Court now enters its final constructions and provides its reasoning for those constructions.

I. DESCRIPTION OF THE ASSERTED PATENTS Plaintiff asserts U.S. Patent Nos. 7,381,657 and 7,544,276. The ’657 Patent is entitled

“Biased pulse DC reactive sputtering of oxide films” while the ’276 Patent is entitled “Biased pulse DC reactive sputtering of oxide films.” The Asserted Patents purport to improve physical vapor deposition (“PVD”), “which is performed in a chamber having a substrate (or wafer); a metal target from which the deposited metal originates; and a plasma between the substrate and the target.” Plaintiff’s Opening at 4 (quoting Plaintiff’s Opening, Ex. 3 (February 16, 2021 Glew Declaration at ¶¶ 17–18)). Figure 1A depicts a PVD chamber comprising five key components: radio-frequency (“RF”) bias power supply 18, substrate 16, target 12, narrow band rejection filter 15, and pulsed DC power supply 14. ’276 Patent at Figure 1, ’657 Patent at Figure 1. 20 Se 18 14 FILTER PDC POWER CI 54 16 NX, 0 17

Figure 1A depicts that RF bias power supply 18 is coupled to electrode 17. ’276 Patent at 5:27— 28. Substrate 16 is capacitively coupled to electrode 17 through insulator 54. Jd. at 5:26—27. Plasma 53 is created when power is applied to target 12. /d. at 5:25—26. Pulsed DC power supply 14 is coupled to narrow-band rejection filter 15, which is coupled to target 12. /d. at 5:19—20. The specifications disclose that the RF bias power from RF bias power supply 18 may flow into pulsed DC power supply 14. See id. at 5:50—-51. In order to prevent the RF bias power from damaging pulsed DC power supply 14, the claimed inventions use a narrow-band rejection filter (“NBRF”), e.g., 2MHz with a bandwidth of 100KHz. /d. at 5:50—51, 5:51-54. A narrow-band rejection filter rejects RF frequencies within the filter bandwidth (100KHz), which is centered around the center frequency (2MHz). By contrast, a RF filter may filter out all RF frequencies above/below a particular threshold, not just those within a particular frequency range.

II. LEGAL STANDARD The general rule is that claim terms are generally given their plain-and-ordinary meaning. Phillips v. AWH Corp., 415 F.3d 1303, 1312 (Fed. Cir. 2005) (en banc); Azure Networks, LLC v. CSR PLC, 771 F.3d 1336, 1347 (Fed. Cir. 2014), vacated on other grounds, 575 U.S. 959, 959 (2015) (“There is a heavy presumption that claim terms carry their accustomed meaning in the

relevant community at the relevant time.”) (internal quotation omitted). The plain-and-ordinary meaning of a term is the “meaning that the term would have to a person of ordinary skill in the art in question at the time of the invention.” Phillips, 415 F.3d at 1313. The “only two exceptions to [the] general rule” that claim terms are construed according to their plain-and-ordinary meaning are when the patentee (1) acts as his/her own lexicographer or (2) disavows the full scope of the claim term either in the specification or during prosecution. Thorner v. Sony Computer Ent. Am. LLC, 669 F.3d 1362, 1365 (Fed. Cir. 2012). The Federal Circuit has counseled that “[t]he standards for finding lexicography and disavowal are exacting.” Hill-Rom Servs., Inc. v. Stryker Corp., 755 F.3d 1367, 1371 (Fed. Cir. 2014). To act as his/her

own lexicographer, the patentee must “clearly set forth a definition of the disputed claim term” and “‘clearly express an intent’ to [define] the term.” Thorner, 669 F.3d at 1365. “Like the specification, the prosecution history provides evidence of how the PTO and the inventor understood the patent.” Phillips, 415 F.3d at 1317. “[D]istinguishing the claimed invention over the prior art, an applicant is indicating what a claim does not cover.” Spectrum Int’l, Inc. v. Sterilite Corp., 164 F.3d 1372, 1379 (Fed. Cir. 1998). The doctrine of prosecution disclaimer precludes a patentee from recapturing a specific meaning that was previously disclaimed during prosecution. Omega Eng’g, Inc. v. Raytek Corp., 334 F.3d 1314, 1323 (Fed. Cir. 2003). “[F]or prosecution disclaimer to attach, our precedent requires that the alleged disavowing actions or statements made during prosecution be both clear and unmistakable.” Id. at 1325–26. Accordingly, when “an applicant’s statements are amenable to multiple reasonable interpretations, they cannot be deemed clear and unmistakable.” 3M Innovative Props. Co. v. Tredegar Corp., 725 F.3d 1315, 1326 (Fed. Cir. 2013).

III. LEGAL ANALYSIS The parties dispute the constructions for the “coupled to” and the “providing” terms in the below table. Term Plaintiff’s Proposed Defendants’ Proposed Construction Construction “coupled to the substrate” / Plain-and-ordinary meaning “coupled to the substrate, “coupled to … the substrate” such that the pulsed DC power source and the RF bias U.S. Patent No. 7,381,657, power are coupled to Claims 1 and 6 different components (target and substrate respectively)”

“providing…to the substrate” Plain-and-ordinary meaning “providing … to the substrate, such that the pulsed U.S. Patent No. 7,544,276, DC power source and the RF Claims 1 and 2 bias power are coupled to different components (target and substrate respectively)”

Background: The Court previously had Markman hearings on August 17, 2021 and February 28, 2022 to construe terms in this case. ECF Nos. 119 and 172, respectively. Defendants moved for further construction based on alleged disclaimers Plaintiff made during IPR proceedings.2 ECF No 263

2 Much of Plaintiff’s Opening Brief—and Defendants’ response to Plaintiff’s arguments—is directed towards arguments unrelated to prosecution disclaimer. Because the Court finds that the claim construction of the disputed terms depends on the whether Plaintiff ‘clearly and unambiguously” disclaimed claim scope, the Court, in the interest of brevity, does not summarize and/or address those arguments. (Motion for Further Claim Construction) at 1.

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Demaray LLC v. Intel Corporation, Counsel Stack Legal Research, https://law.counselstack.com/opinion/demaray-llc-v-intel-corporation-txwd-2023.