Anvik Corporation v. Nikon Precision, Inc.

519 F. App'x 1019
CourtCourt of Appeals for the Federal Circuit
DecidedMarch 22, 2013
Docket2012-1320, 2012-1321, 2012-1322, 2012-1323, 2012-1324, 2012-1325, 2012-1326, 2012-1327, 2012-1328, 2012-1329
StatusUnpublished

This text of 519 F. App'x 1019 (Anvik Corporation v. Nikon Precision, Inc.) is published on Counsel Stack Legal Research, covering Court of Appeals for the Federal Circuit primary law. Counsel Stack provides free access to over 12 million legal documents including statutes, case law, regulations, and constitutions.

Bluebook
Anvik Corporation v. Nikon Precision, Inc., 519 F. App'x 1019 (Fed. Cir. 2013).

Opinion

BRYSON, Circuit Judge.

The district court held the three asserted patents in this case invalid for failing to satisfy the “best mode” requirement found in 35 U.S.C. § 112. The America Invents Act, Pub. L. No. 112-29 (2011), eliminated failure to satisfy the best mode requirement as a ground for invalidating issued patents. However, the statutory amendment that removed best mode from the list of invalidating conditions for issued patents was not given retroactive effect for cases, such as this one, that were filed before the new statute was enacted. Accordingly, the district court properly considered whether the best mode requirement had been satisfied.

The question whether the best mode requirement has been satisfied is highly factual. In this case, after reviewing the deposition testimony of Dr. Kanti Jain, the named inventor of all three patents and the founder and president of Anvik Corporation, the district court was understandably concerned that Dr. Jain may have concealed certain aspects of the best mode for practicing the invention claimed in the patents. While Dr. Jain did his cause no favors with his testimony, we are persuaded based on the record as a whole that there remain disputed issues of material fact bearing on the best mode question, and we therefore reverse the grant of summary judgment and remand the case for further proceedings.

I

Anvik brought suit against a number of manufacturers and sellers of electronic equipment, alleging that they had infringed the three patents in suit, U.S. Patents No. 4,924,257 (“the '257 patent”); 5,285,-236 (“the '236 patent”); and 5,291,240 (“the '240 patent”). Anvik’s theory was that the manufacturer and seller defendants had infringed by using scanners made by the Nikon defendants. The patents at issue in this case are directed to photolithography systems used to make electronic products such as liquid crystal display panels. The claimed systems selectively expose a substrate to electromagnetic radiation through a mask by the use of partially overlapping scans of the mask and substrate to ensure that the substrate is exposed uniformly and seamlessly.

All three of the patents in suit follow the same basic pattern: each claims a “scan and repeat” system for high-resolution, large-field lithography. In each patent, the asserted claims recite, as part of the claimed lithography system, an illumination subsystem satisfying certain requirements. The illumination subsystem set forth in asserted claim 17 of the '257 patent is representative. That portion of claim 17 recites: “an illumination subsystem having the desired characteristics of wavelength and intensity distribution, having an effective source plane in the shape of a polygon, and capable of uniformly illuminating a polygon-shaped region on the mask.” The specification of the '257 *1022 patent, which is also representative, describes the illumination subsystem as consisting of an illumination source system, a relay lens, and a beam-steering mechanism. The illumination subsystem is described as being “such that its effective emission plane ... is in the shape of a regular hexagon.” The illumination source system is not otherwise described, but is depicted in the patent figures as a box with a hexagonal-shaped emission plane at one end. '257 patent, col. 4,11. 7-21.

In a separate patent application filed before the applications for the patents in suit, Dr. Jain described and claimed a particular illumination system. That application became U.S. Patent No. 5,059,013 (“the '013 patent”), which was issued to Dr. Jain on October 22, 1991, after the issuance of the '257 patent in 1990 but before either the application for, or issuance of, the '236 and '240 patents in 1994. The '013 patent claimed an illumination system producing a light beam that could be used in lithography systems such as those claimed in the '257, '236, and '240 patents. In its preferred embodiment, the illumination system of the '013 patent used a hexagonal “shaping aperture” and a hexagonal-shaped tunnel lined on the inside with mirrors, which the '013 patent referred to as a “hexagonal beam-shaper-uniformizer.”

At the time, Dr. Jain recorded his ideas for improving lithography systems, along with illustrations and detailed descriptions, in his notebook. His drawing of the illumination system that formed the basis for the '013 patent was found in the same notebook as the drawings that formed the bases for the '257, '236, and '240 patents. Specifically, he drew a hexagonal light tunnel that appears virtually identical to the one that would be depicted in Figure lb of the '013 patent. Dr. Jain’s notebook refers to the hexagonal tunnel in the course of discussing of how to create a hexagonal-shaped light beam required for the scan and repeat method claimed in the patents in suit.

During pretrial discovery, the defendants sought to establish that Dr. Jain regarded the illumination system used in the '013 patent as the best mode for creating the overlapping hexagonal light beams used in his scan and repeat method. They argued that the evidence showed he considered it his best mode and failed to disclose it in the '257, '236, and '240 patents, and that those patents were therefore invalid.

II

The district court granted summary judgment, holding all three patents invalid for failing to satisfy the best mode requirement. The court based its ruling mainly on Dr. Jain’s deposition testimony, which the court interpreted as admitting that the illumination source recited in the '013 patent was “better than anything in the prior art and anything of which he was aware and which he could remember at the time.”

The district court pointed to several of Dr. Jain’s statements during his deposition to support its interpretation. Dr. Jain testified that when he filed the application for the '013 patent, he believed that the method it described “had advantages over prior art methods,” and that it “had advantages over some other methods.” While he stated that he did not regal'd the illumination system of the '013 patent as the best illumination source to use in connection with the asserted claims, he was unable to identify any particular alternatives that would serve that purpose better. Nonetheless, Dr. Jain testified that “there were many variations” among illumination methods that could provide uniform hexagonal illumination on the substrate and that the method of the '013 patent “certainly is not *1023 the only optimum method.” He added, however, that he “[could] not recall what the other methods were.”

When asked whether he had any other pending patent applications “that dealt with the uniformization of the light in an illumination system besides the application that led to the '013 patent,” Dr. Jain replied, “I don’t recall, but I think what I described in the '013 patent, that configuration for an illumination system to produce uniform polygonal exposure, most likely was the best that I had thought of until then.” However, when he was directly asked whether the preferred embodiment “of a lithography system practicing the methods of the '257 patent ... used light provided by a hexagonal beam shaper and uniformizer tunnel to provide nominal hexagon shape and uniform light,” Dr. Jain replied that was “not right.” In addition, Dr.

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519 F. App'x 1019, Counsel Stack Legal Research, https://law.counselstack.com/opinion/anvik-corporation-v-nikon-precision-inc-cafc-2013.