Washington § 82.12.970 Exemptions—Gases and chemicals used to manufacture semiconductor materials.(Contingent effective date; contingent expiration date.)

Washington Statutes

§ 82.12.970 — Exemptions—Gases and chemicals used to manufacture semiconductor materials.(Contingent effective date; contingent expiration date.)

Washington § 82.12.970

Title 82EXCISE TAXES

Ch. 82.12USE TAX

This text of Washington § 82.12.970 (Exemptions—Gases and chemicals used to manufacture semiconductor materials.(Contingent effective date; contingent expiration date.)) is published on Counsel Stack Legal Research, covering Washington primary law. Counsel Stack provides free access to over 12 million legal documents including statutes, case law, regulations, and constitutions.

Bluebook

Wash. Rev. Code § 82.12.970 (2026).

Text

(1)The provisions of this chapter do not apply with respect to the use of gases and chemicals used by a manufacturer or processor for hire in the manufacturing of semiconductor materials. This exemption is limited to gases and chemicals used in the manufacturing process to grow the product, deposit or grow permanent or sacrificial layers on the product, to etch or remove material from the product, to anneal the product, to immerse the product, to clean the product, and other such uses whereby the gases and chemicals come into direct contact with the product during the manufacturing process, or uses of gases and chemicals to clean the chambers and other like equipment in which such processing takes place. For purposes of this section, "semiconductor materials" has the same meaning as provi

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(1) The provisions of this chapter do not apply with respect to the use of gases and chemicals used by a manufacturer or processor for hire in the manufacturing of semiconductor materials. This exemption is limited to gases and chemicals used in the manufacturing process to grow the product, deposit or grow permanent or sacrificial layers on the product, to etch or remove material from the product, to anneal the product, to immerse the product, to clean the product, and other such uses whereby the gases and chemicals come into direct contact with the product during the manufacturing process, or uses of gases and chemicals to clean the chambers and other like equipment in which such processing takes place. For purposes of this section, "semiconductor materials" has the same meaning as provided in RCW 82.04.241 .

(2) A person claiming the exemption under this section must file a complete annual tax performance report with the department under RCW 82.32.534 . No application is necessary for the tax exemption. The person is subject to all of the requirements of chapter 82.32 RCW.

(3) Any person who has claimed the exemption under this section must reimburse the department for 50 percent of the amount of the tax preference under this section if the number of persons employed by the person claiming the tax preference is less than 90 percent of the person's three-year employment average for the three years immediately preceding the year in which the exemption is claimed.

(4) Pursuant to RCW 82.32.790 , this section is contingent on the siting and commercial operation of a significant semiconductor microchip fabrication facility in the state of Washington.

(5) This section expires January 1, 2034, unless the contingency in RCW 82.32.790 (2) occurs.

Tax preference performance statement exemption — Effective date — 2024 c 261 ss 2-9: See notes following RCW 82.04.241 .

Effective date — 2017 3rd sp.s. c 37 ss 101-104, 403, 503, 506, 508, 510, 512, 514, 516, 518, 520, 522, 524, 526, 703, 705, 707, and 801-803: See note following RCW 82.04.2404 .

Expiration date — 2017 3rd sp.s. c 37 ss 502, 505, 507, 509, 511, 513, 515, 517, 519, 521, 523, and 525: See note following RCW 82.04.2404 .

Contingent effective date — 2017 c 135; 2010 c 114: See RCW 82.32.790 .

Effective date — 2017 c 135: See note following RCW 82.32.534 .

Finding — Intent — 2010 c 114: See note following RCW 82.32.534 .

Findings — Intent — 2003 c 149: See note following RCW 82.04.426 .

Legislative History

[2024 c 261 s 8. Prior:2017 3rd sp.s. c 37 s 522; (2017 3rd sp.s. c 37 s 521 expired January 1, 2018);2017 c 135 s 32;2010 c 114 s 131;2003 c 149 s 8.]