Vlsi Technology LLC v. Intel Corporation

CourtCourt of Appeals for the Federal Circuit
DecidedNovember 15, 2022
Docket21-1826
StatusPublished

This text of Vlsi Technology LLC v. Intel Corporation (Vlsi Technology LLC v. Intel Corporation) is published on Counsel Stack Legal Research, covering Court of Appeals for the Federal Circuit primary law. Counsel Stack provides free access to over 12 million legal documents including statutes, case law, regulations, and constitutions.

Bluebook
Vlsi Technology LLC v. Intel Corporation, (Fed. Cir. 2022).

Opinion

Case: 21-1826 Document: 54 Page: 1 Filed: 11/15/2022

United States Court of Appeals for the Federal Circuit ______________________

VLSI TECHNOLOGY LLC, Appellant

v.

INTEL CORPORATION, Appellee ______________________

2021-1826, 2021-1827, 2021-1828 ______________________

Appeals from the United States Patent and Trademark Office, Patent Trial and Appeal Board in Nos. IPR2019- 01198, IPR2019-01199, IPR2019-01200. ______________________

Decided: November 15, 2022 ______________________

NATHAN NOBU LOWENSTEIN, Lowenstein & Weather- wax LLP, Santa Monica, CA, argued for appellant. Also represented by KENNETH J. WEATHERWAX.

S. CALVIN WALDEN, Wilmer Cutler Pickering Hale and Dorr LLP, New York, NY, argued for appellee. Also repre- sented by JEFFREY ANDREW DENNHARDT; MARK CHRISTOPHER FLEMING, JOHN V. HOBGOOD, STEPHANIE LIN, Boston, MA; RONALD GREGORY ISRAELSEN, Washington, DC. ______________________ Case: 21-1826 Document: 54 Page: 2 Filed: 11/15/2022

Before CHEN, BRYSON, and HUGHES, Circuit Judges. BRYSON, Circuit Judge. Appellee Intel Corporation filed three petitions for in- ter partes review (“IPR”) of U.S. Patent No. 7,247,552 (“the ’552 patent”), which is owned by appellant VLSI Technol- ogy LLC. The Patent Trial and Appeal Board instituted the IPR proceedings, and in a combined Final Written De- cision, the Board found all of the challenged claims of the ’552 patent to be unpatentable. For the reasons set forth below, we affirm in part, reverse in part, and remand. I A The ’552 patent is directed to “[a] technique for allevi- ating the problems of defects caused by stress applied to bond pads” of an integrated circuit. ’552 patent, Abstract. An integrated circuit, sometimes referred to as a “chip” or “die,” contains numerous electronic circuits that are in- tegrated on a flat piece of semiconductor called a “sub- strate.” The specification of the ’552 patent discloses an integrated circuit that includes several metal “interconnect layers” positioned above the substrate and frequently sur- rounded by “dielectric” or insulating material. See id. at col. 3, ll. 1–10 & Fig. 1. The integrated circuits described in the ’552 patent also include one or more “bond pads” that sit above the interconnect layers and are used to attach the chip to another electronic component, such as a computer motherboard. See id. at col. 3, ll. 22–25. When a chip is attached to another electronic compo- nent, forces are exerted on the chip’s bond pad. Id. at Ab- stract & col. 5, ll. 53–57. Those forces can result in damage to the interconnect layers and to the dielectric material that surrounds those layers. See id. at Abstract & col. 1, ll. 39–42. As such, dedicated support structures made of metal layers and vias are connected to and provide support Case: 21-1826 Document: 54 Page: 3 Filed: 11/15/2022

VLSI TECHNOLOGY LLC v. INTEL CORPORATION 3

for the bond pad. See id. at col. 1, ll. 53–61. In the prior art, these metal support layers were linked to the bond pad, and thus were not “functionally independent,” i.e., they could not be “used for wiring or interconnects unrelated to the pad.” Id. at col. 1, ll. 58–64. The ’552 patent discloses improvements to the struc- tures of an integrated circuit that reduce the potential for damage to the interconnect layers and dielectric material when the chip is attached to another electronic component while also “permit[ing] each of the interconnect layers un- derlying [the pad] to be functionally independent in the cir- cuit if desired.” See id. at col. 3, line 64 through col. 4, line 7. Specifically, the ’552 patent discloses that only “a pre- determined minimum amount of metal or a minimum den- sity” is needed to “adequately support” the bond pad. See id. at col. 3, line 64 through col. 4, line 4. If the function- ally independent interconnect layers underneath the pad are insufficient to reach a predetermined minimum den- sity, “dummy metal lines”—i.e., metal lines that do not serve any electrical purpose—may be added to increase the metal density of the interconnect layers. See id. at col. 4, ll. 13–56; see also id. at Fig. 3. Claim 1 is the only independent apparatus claim of the ’552 patent and is representative of the claimed invention. It recites as follows: 1. An integrated circuit, comprising: a substrate having active circuitry; a bond pad over the substrate; a force region at least under the bond pad char- acterized by being susceptible to defects due to stress applied to the bond pad; a stack of interconnect layers, wherein each in- terconnect layer has a portion in the force region; and Case: 21-1826 Document: 54 Page: 4 Filed: 11/15/2022

a plurality of interlayer dielectrics separating the interconnect layers of the stack of interconnect layers and having at least one via for interconnect- ing two of the interconnect layers of the stack of in- terconnect layers; wherein at least one interconnect layer of the stack of interconnect layers comprises a functional metal line underlying the bond pad that is not elec- trically connected to the bond pad and is used for wiring or interconnect to the active circuitry, the at least one interconnect layer of the stack of inter- connect layers further comprising dummy metal lines in the portion that is in the force region to ob- tain a predetermined metal density in the portion that is in the force region. ’552 patent, claim 1. Claim 2 depends from claim 1, and claim 11 is a method claim generally similar to claim 1. Claim 20 also plays a role in this appeal. It recites as follows: 20. A method of making an integrated circuit hav- ing a plurality of bond pads, comprising: developing a circuit design of the integrated circuit; developing a layout of the integrated circuit ac- cording to the circuit design, wherein the layout comprises a plurality of metal-containing intercon- nect layers that extend under a first bond pad of the plurality of bond pads, at least a portion of the plurality of metal-containing interconnect layers underlying the first bond pad and not electrically connected to the bond pad as a result of being used for electrical interconnection not directly connected to the bond pad; Case: 21-1826 Document: 54 Page: 5 Filed: 11/15/2022

VLSI TECHNOLOGY LLC v. INTEL CORPORATION 5

modifying the layout by adding dummy metal lines to the plurality of metal-containing intercon- nect layers to achieve a metal density of at least forty percent for each of the plurality of metal-con- taining interconnect layers; and forming the integrated circuit comprising the dummy metal lines. ’552 patent, claim 20. B In 2018, VLSI brought suit in the United States Dis- trict Court for the District of Delaware, charging Intel with infringing the ’552 patent. The district court subsequently conducted a claim construction hearing. In the course of the hearing, the court construed the term “force region,” which appears in independent claims 1 and 11 of the ’552 patent. Citing a passage from the ’552 patent, the district court construed “force region” to mean a “region within the integrated circuit in which forces are exerted on the inter- connect structure when a die attach is performed.” J.A. 6017, 6356; see also ’552 patent, col. 3, ll. 49–52. In June 2019, after the district court action was filed but before the claim construction proceedings in that ac- tion, Intel filed its petitions for IPR, challenging the valid- ity of claims 1, 2, 11, and 20 of the ’552 patent. In the petition directed to claims 1 and 2, Intel proposed a con- struction of “force region” that was consistent with the claim construction that Intel subsequently offered to the district court and that the district court adopted, i.e., a “re- gion within the integrated circuit in which forces are ex- erted on the interconnect structure when a die attach is performed.” J.A. 6588–89.

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Vlsi Technology LLC v. Intel Corporation, Counsel Stack Legal Research, https://law.counselstack.com/opinion/vlsi-technology-llc-v-intel-corporation-cafc-2022.